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Facilities Available


  • Gaas Crystal Growth Facility
  • Molecular Beam Epitaxy System
  • Ion – Implantation system
  • Electron Beam Micro Lithography system
  • MOCVD system
  • LPE System  
  • Mask Fabrication Facility
  • Fourier Transform IR Spectrophotometer (2.5 – 25 m range)
  • RF probing station
  • Scalar and Vector Network Analyser
  • Electron probe Micro Analyser
  • Fab line for fabrication of MMIC
Gaas Crystal Growth Facility
Gaas Crystal Growth Facility
Molecular Beam Epitaxy System
Molecular Beam Epitaxy System

Mask Fabrication Facility
Mask Fabrication Facility
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